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Physical Vapor Deposition of Thin Films

Physical Vapor Deposition of Thin Films

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Author: John E. Mahan
Publisher: Wiley-Interscience
Category: Book

List Price: $145.00
Buy New: $110.20
You Save: $34.80 (24%)



New (16) Used (8) from $110.20

Rating: 4.5 out of 5 stars 2 reviews
Sales Rank: 924087

Media: Hardcover
Edition: 1
Number Of Items: 1
Pages: 336
Shipping Weight (lbs): 1.2
Dimensions (in): 9.3 x 6.4 x 0.9

ISBN: 0471330019
Dewey Decimal Number: 671.735
EAN: 9780471330011
ASIN: 0471330019

Publication Date: February 1, 2000
Availability: Usually ships in 1-2 business days
Shipping: International shipping available
Condition: Brand New, Perfect Condition, Please allow 4-14 business days for delivery. 100% Money Back Guarantee, Over 1,000,000 customers served.

Also Available In:

  • Kindle Edition - Physical Vapor Deposition of Thin Films
  • Digital - Physical Vapor Deposition of Thin Films

Similar Items:

  • Thin-Film Deposition: Principles and Practice
  • Handbook of Physical Vapor Deposition (PVD) Processing (Materials Science and Process Technology Series)
  • A User's Guide to Vacuum Technology
  • The Materials Science of Thin Films
  • Thin Film Materials: Stress, Defect Formation and Surface Evolution

Editorial Reviews:

Product Description
A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of:
* Thermal evaporation, sputtering, and pulsed laser deposition techniques
* Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges
* Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets
* Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam



Customer Reviews:

5 out of 5 stars Very useful text   May 3, 2007
I found this book very useful and practical. It is nice to see a book that balances a good combination of theory and practicality.


4 out of 5 stars ...a practical book   September 14, 2005
This book is more practical than theoretical... It include the basic concepts of vacuum and practical plasmas (like sputering plasma... I like it becouse there are many numerical examples to apply the ecuations and to explain the fundamentals of plasma modelling. It is a basic book

 
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