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Principles of Plasma Discharges and Materials Processing , 2nd Edition | 
 enlarge | Authors: Michael A. Lieberman, Alan J. Lichtenberg
Publisher: Wiley-Interscience
Category: Book
List Price: $145.00
Buy New: $90.04
You Save: $54.96 (38%)
New (20) Used (9) from $90.04
Rating:  5 reviews
Sales Rank: 154019
Media: Hardcover
Edition: 2
Number Of Items: 1
Pages: 800
Shipping Weight (lbs): 2.7
Dimensions (in): 9.3 x 6.4 x 1.7
ISBN: 0471720011
Dewey Decimal Number: 530.44
EAN: 9780471720010
ASIN: 0471720011
Publication Date: April 14, 2005
Availability: Usually ships in 1-2 business days
Shipping: Expedited shipping available
Condition: Brand New, HARDCOVER, US student edition *free priority mail upgrade*(ship with delivery confirmation)
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Product Description
A Thorough Update of the Industry Classic on Principles of Plasma Processing
The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals.
The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.
New and expanded topics include:
* Updated cross sections
* Diffusion and diffusion solutions
* Generalized Bohm criteria
* Expanded treatment of dc sheaths
* Langmuir probes in time-varying fields
* Electronegative discharges
* Pulsed power discharges
* Dual frequency discharges
* High-density rf sheaths and ion energy distributions
* Hysteresis and instabilities
* Helicon discharges
* Hollow cathode discharges
* Ionized physical vapor deposition
* Differential substrate charging
With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
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| Customer Reviews:
 outstanding plasma resource January 16, 2007
3 out of 3 found this review helpful
One of the most practical and comprehensive resources on plasma phyics and engineering. The book is much easier to understand and more in depth than most other books on the subject, except for maybe chen (who takes more of a physics approach, whereas lieberman takes more of an engineering approach) This book is a must have for anyone working with or studying plasmas.
 Overrated May 5, 2000
14 out of 18 found this review helpful
As a praciticing process engineer my opinion is this book lacks insight. Typical text book written a professor in the academic community with no practical experience. This book spends far to much time deriving equations and not discussing the basics concepts. The author makes a half hearted attempt to relate the first 14 chapters to the real worl, in a short and inadequate Chapter 15. This is the first mail book order book i took the time to return. In all honesty this book is not worth the $90.00. Spend your money elsewhere
An excellent overview of common plasma processing devices December 10, 1998
4 out of 8 found this review helpful
Lieberman covers many of the standard processing devices and much of the physics needed to model them effectively.The presentation is clear and extremely useful both as a reference and as a tutorial. A must-have book for anyone interested in plasma processing.
The book provides an excellent overview of plasma processing December 10, 1998
5 out of 10 found this review helpful
This book provides an excellent introduction and overview of plasma discharges applied to semiconductor manufacturing. It is well-organized, clearly-written and full of useful examples and exercises. And unlike many books on plasma physics, it is not overly-mathematical and contains many useful physical insights. I strongly recommend this book for anyone wanting to review the field of plasma processing.
Very Good Theoretical Coverage of Plasma's, including ECR May 1, 1998
3 out of 6 found this review helpful
This book provides a theoretical overview of plasma's, including coverage of ECR applications. This was very valuable for Hitachi Etchers. The theory is presented at an undergraduate level and assumes the reader has knowledge of vector analysis. Highly recommended for any Etch Process Engineer in the Semiconductor Industry.
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