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Thin Film Materials: Stress, Defect Formation and Surface Evolution (Cambridge Pocket Clinicians) | 
 enlarge | Authors: L. B. Freund, S. Suresh
Publisher: Cambridge University Press
Category: Book
List Price: $70.00
Buy New: $66.13
You Save: $3.87 (6%)
Rating:  3 reviews
Sales Rank: 1560699
Media: Paperback
Edition: 1
Pages: 768
Shipping Weight (lbs): 3.3
Dimensions (in): 9.7 x 6.9 x 1.4
ISBN: 0521529778
Dewey Decimal Number: 620
EAN: 9780521529778
ASIN: 0521529778
Publication Date: January 31, 2009 (In 25 Days)
Shipping: Eligible for Super Saver Shipping
Availability: Not yet published
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Product Description
This book provides comprehensive coverage of stress, defect formation and surface evolution in thin films. With its balanced coverage of theory, experiment and simulation and many homework problems, the text will be essential reading in senior undergraduate and graduate courses on thin films.
Book Description
Thin films play an important role in many technological applications which include: microelectronic devices, magnetic storage media and surface coatings. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation and surface evolution in thin films. Of particular interest to engineers, materials scientists and physicists, it provides a balanced coverage of theory, experiment and simulation. Highly illustrated and containing numerous homework problems, this book will be essential reading on senior undergraduate and graduate courses on thin films.
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| Customer Reviews:
 A good book indeed; highly recommend it. March 20, 2007
1 out of 1 found this review helpful
To the curious minds of tomorrow:
I like this book for it is a rather comprehensive treatment of the subject, and is written in a clear prose. However, one should realize that the focus is solely on the mechanical behavior of thin films, which could be attributed to the authors background and research interests.
Virtually all properties of thin films (electronic, magnetic, optical, ferroelecrtic, multiferroic etc.) are affected if not chiefly governed by elastic coupling of "order" parameters with strains and such, especially at nanoscopic length scales. However, this book is primarly devoted to mechanical behavior of thin films in an isolated fashion. For instance, misfit dislocation and critical thickness phenomena in thin films is treated with linear elasticity models, so much so that it is of limited use in thin films of strongly correlated systems (ferromagnetics, ferroelecrtics, multiferroics etc.). Therefore, the uninitiated reader should proceed with caution.
At any rate, the book by Freund and Suresh would be an ideal introductory survey for those interested in the mechanical behavior of thin solid films, and I highly recommend it.
Cheers,
Entropy4Life
 highly recommend it December 23, 2005
5 out of 5 found this review helpful
Okay we followed this book for our lecture in thin films given by the first author of the book LB Freund, one of the best instructors i ever had. i will try not to be biased by his teaching skills while writing this review. i would say that its a must reference who are working in thin film area be it experimental or modeling. but i believe that you need to have a sound background atleast in continuum mechanics and elasticity to fully follow the mechanics (of deformation) part of the thin film on your own. the best thing i liked about this book is its methodical structure for e.g. deriving the basic Stoney's relation by minimizing the energy, then talk about its assumption in detail and then removing those assumptions one by one to make the relation more realistic (and offcourse more complicated). there are other things like material properties of common thin film materials used in microelectronics, topics on surface morphology etc. his writing style is very clear... again not for someone who doesnt have necessary background.
Excelente referencia..... May 10, 2005
1 out of 8 found this review helpful
Un tema que me ha procupado mucho durante el desarrollo de mi trabajo de tesis con recubrimientos es los esfuersos residuales que se generan durante el proceso de sintesis.... definitivamente este libro ha despejado mis dudas sobre el tema y ha sido una excelente referencia para mi trabajo....
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